Bevorzugte Bezeichnung
attributes
Unterbegriffe
- absorbance
- acidity
- acquisition mode
- active acquisition time
- active area
- aging time
- apparent quantum yield
- bandgap energy
- basicity
- beam energy
- calcination dwelling time
- calcination final temperature
- calcination heating rate
- calcination initial temperature
- calcination step
- calcincation gas flow rate
- catalyst bed height
- catalyst bed volume
- catalyst form
- catalyst performance measure
- catalyst type
- categories of semiconductors
- chemical conversion
- chemical conversion performance measure
- chemoselectivity
- chirality
- composition
- concentration
- concentration of chemical substance for synthesis
- crystallinity
- current
- current density
- dead time
- dead time correction
- detector excitation material thickness
- detector performance measure
- detector type
- detector window dead layer
- detector window material
- dispersion
- drying temperature
- drying time
- electrical charge
- electrical charge density
- electrical potential
- electrochemical environment
- enantioselectivity
- experiment duration
- experiment pressure
- experiment pressure drop
- experiment temperature
- extent of reaction
- Fano factor
- faradaic efficiency
- fluorescence signal
- fluorescence yield
- frequency
- gas chromatograph sensitivity
- gas feed
- gas hourly space velocity
- impedance
- irradiation duration
- light source property
- linear calibration
- liquid hourly space velocity
- manual energy shift
- mass coverage
- mass of chemical substance for synthesis
- mass spectrometer sensitivity
- measurement channel
- measurement matrix size
- measurement reference material
- measurement reference time
- membrane thickness
- molar equivalent
- nanostructure
- number of voltammetry cycles
- open circuit voltage
- operation mode
- operation parameters
- optical window dimensions
- optical window material
- particle size
- peak area
- Peak full width at half maximum
- pore size distribution
- powder mass
- preparation method
- product concentration
- product identification method
- purging duration
- purging gas
- purging temperature
- rate of consumption
- rate of formation
- reactant concentration
- reactant flow rate
- reactant purity
- reaction chamber dimension
- reaction chamber material
- reaction chamber shape
- reaction chamber volume
- reaction conditions
- reaction name
- reaction rate
- reaction temperature
- reaction type
- reactor design type
- reactor feed
- reactor performance measure
- reactor temperature
- regioselectivity
- resistance
- retention time
- sample azimuth angle
- sample magnification
- sample mass
- sampling frequency
- sampling interval
- scanning dwell time
- semiconductor property
- sieve fraction
- signal integration time
- signal range
- solubility
- spatial sampling interval
- specific reaction rate
- specific surface area
- stability
- stage tilt
- substrate dimension
- substrate material
- synthesis duration
- synthesis pH
- synthesis pressure
- synthesis temperature
- thin film dimension
- thin film mass
- total faradaic efficiency
- turnover frequency
- turnover number
- voltammetry cycle
- volume of chemical substance for synthesis
- weight hourly space velocity
- X-ray photon energy
Bezeichner
- 0000186
In anderen Sprachen
Englisch
URI
https://w3id.org/nfdi4cat/voc4cat_0000186